Rapid etching X-rayed, Physicists unveil processes during fast chemical dissolution.
A breakthrough in the study of chemical reactions during etching and coating of materials was achieved by a research group headed by Kiel physicist, Professor Olaf Magnussen. The team from the Christian-Albrechts-Universität zu Kiel (CAU), Germany, in collaboration with staff from the European Synchrotron Radiation Facility (ESRF) in Grenoble, France, have uncovered for the first time just what happens in manufacturing processes, used for the formation of metal contacts thinner than a human hair in modern consumer electronics, such as flat-screen television. The results appear as the cover feature in the current issue (23.3.2011) of the renowned Journal of the American Chemical Society.
For their research the scientists used the intense X-ray radiation of the experimental station ID32, one of the ESRF's instruments. The X-ray beam was directed onto a gold surface while it dissolved in diluted hydrochloric acid. Because the reflected X-rays are sensitive to tiny changes in the atomic arrangement at the material's surface, the metal removal during the reaction can be precisely measured.
The ESRF is a European research institution, funded by 19 nations, providing and utilizing brilliant synchrotron X-rays for advanced scientific research.
Original publication: F. Golks, K. Krug, Y. Gründer, J. Zegenhagen, J. Stettner, O. Magnussen: High-speed in situ surface X-ray diffraction studies of the electrochemical dissolution of Au(001). Journal of the American Chemical Society 2010, 133, 3772
Contact: Dr. Olaf Magnussen firstname.lastname@example.org 49-431-880-5579 Kiel University